Determination of the thickness on nm layers by electron
Weinbruch S., Möller A., and Stadermann F. J. (1995)
Berichte der Deutschen Mineralogischen Gesellschaft, Beih. z. Eur. J.
Mineral. 7(1), 236.
Thin ﬁlms are of high signiﬁcance in many technological ﬁelds
(e.g., protective coatings against corrosion, diffusion barrier layers
in Si technology, CVD diamond layers for new applications in
tribology). Knowledge of the chemical composition and thickness of the
layers is important for the manufacturing process and the performance
of these materials. In this contribution we want to demonstrate the
suitability of electron probe microanalysis (EPMA) for accurate
determination of layer thicknesses in the nm range.